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The Role of Growth-Pressure on the Determination of Anisotropy Properties in Nonpolar m-Plane GaN

机译:生长压力在确定非极性m平面GaN各向异性中的作用

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摘要

This study reports the role of growth-pressure on the determination of anisotropy properties in nonpolar m-plane GaN. In the high-pressure-growth samples, unrelieved lattice misfit strain lead to larger anisotropic in-plane strains, a striated surface, lower densities of basal-plane stacking faults (BSF) and prismatic stacking faults (PSF), and a smaller anisotropic polarization. In contrast, the low-pressure-growth sample shows the opposite trend. It is suggested that the growth pressure determines the degree of relaxation of lattice misfit strain, which in turn affects the anisotropic in-plane strains, striation feature, densities of BSF and PSF, and degree of polarization. The research results can be used to optimize the growth of nonpolar m-plane GaN.
机译:这项研究报告了生长压力在确定非极性m面GaN各向异性特性中的作用。在高压生长样品中,未消除的晶格失配应变会导致较大的各向异性面内应变,横纹表面,较低的基面堆积断层(BSF)和棱柱状堆积断层(PSF)密度以及较小的各向异性极化。相反,低压增长样本显示出相反的趋势。有人认为,生长压力决定了晶格失配应变的弛豫程度,这反过来又影响了各向异性平面应变,条纹特征,BSF和PSF的密度以及极化程度。研究结果可用于优化非极性m面GaN的生长。

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