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首页> 外文期刊>ECS Journal of Solid State Science and Technology >Potential of Enhancement Mode In0.65Ga0.35As/InAs/In0.65Ga0.35As HEMTs for Using in High-Speed and Low-Power Logic Applications
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Potential of Enhancement Mode In0.65Ga0.35As/InAs/In0.65Ga0.35As HEMTs for Using in High-Speed and Low-Power Logic Applications

机译:增强模式In0.65Ga0.35As / InAs / In0.65Ga0.35As HEMT的潜力,可用于高速和低功耗逻辑应用

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摘要

In this study, a 60-nm enhancement-mode (E-mode) In0.65Ga0.35As/InAs/In0.65Ga0.35As high electron mobility transistor (HEMT) was developed, and its potential for use inhigh-speed and low-power logic applications was investigated. When the E-mode device was biased at a drain-source voltage of 0.5 V, it demonstrated a cutoff frequency of 169 GHz, drain-induced barrier lowering of 70 mV/V, minimum subthreshold swing of 67 mV/decade, and ION/IOFF ratio greater than 1.6 x 10(4). The high performance of the E-mode device is attributed to the use of a thin barrier layer along with Pt gate sinking technology. These results confirm that E-mode In0.65Ga0.35As/InAs/In0.65Ga0.35As HEMTs have great potential for use inhigh-speed and low-power logic applications. (C) 2015 The Electrochemical Society. All rights reserved.
机译:在这项研究中,开发了60纳米增强模式(E模式)的In0.65Ga0.35As / InAs / In0.65Ga0.35As高电子迁移率晶体管(HEMT),其在高速和低功耗环境中的使用潜力对电源逻辑应用进行了研究。当E模式设备以0.5 V的漏源电压偏置时,它的截止频率为169 GHz,漏感引起的势垒降低了70 mV / V,最小亚阈值摆幅为67 mV /十倍,并且ION / IOFF比率大于1.6 x 10(4)。 E模式设备的高性能归因于薄的势垒层以及Pt栅极下沉技术的使用。这些结果证实,E模式In0.65Ga0.35As / InAs / In0.65Ga0.35As HEMT具有在高速和低功耗逻辑应用中使用的巨大潜力。 (C)2015年电化学学会。版权所有。

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