...
首页> 外文期刊>ECS Journal of Solid State Science and Technology >Electrical Investigation of Porous Silicon/p-Si Heterojunction Prepared by Electrochemical Etching
【24h】

Electrical Investigation of Porous Silicon/p-Si Heterojunction Prepared by Electrochemical Etching

机译:电化学刻蚀制备多孔硅/ p-Si异质结的电学研究

获取原文
获取原文并翻译 | 示例

摘要

We presented the conduction mechanism investigation of porous silicon/p-Si heterojunction fabricated on low resistivity crystalline silicon by electrochemical anodization. Measurements of the current - voltage I(V) and capacitance - voltage C(V) characteristics were used for the study of the electrical properties of this heterojunction. A deeper understanding of the physical mechanisms involved in the Au/porous silicon contacts and porous silicon/p-Si interface can be obtained from the voltage dependence of the fitting parameters according to electrical model circuits in DC and AC. We found in the heterojunction important conduction mechanisms: the resonant tunnelling, SCLC and the dielectric relaxation due to the pores layers at high frequencies. (c) 2016 The Electrochemical Society. All rights reserved.
机译:我们介绍了通过电化学阳极氧化在低电阻率晶体硅上制造的多孔硅/ p-Si异质结的传导机理。电流-电压I(V)和电容-电压C(V)特性的测量用于研究此异质结的电性能。根据直流和交流电模型电路的拟合参数的电压依赖性,可以更深入地了解金/多孔硅触点和多孔硅/ p-Si界面所涉及的物理机制。我们在异质结中发现了重要的传导机制:共振隧穿,SCLC和由于孔隙层在高频引起的介电弛豫。 (c)2016年电化学学会。版权所有。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号