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Surface and bulk structural properties of nanostructured porous silicon prepared by electrochemical etching at different etching time

机译:在不同刻蚀时间下通过电化学刻蚀制备的纳米结构多孔硅的表面和整体结构性质

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摘要

Nanostructured porous silicon (NPSi) is versatile nanomaterials, and attractive area in device application after visible luminescence was observed from NPSi by Canham (1990). NPSi has been prepared by electrochemical techniques with silicon wafer as a based material. The electrolyte solution consists of ethanol and hydrofluoric acid at volume ratio of 1:1. The etching time was varied while other preparation parameters were fixed to produce different porosity of NPSi samples. The structural properties of samples were measured using field emission scanning electron microscope and Raman spectrometer. The surface structural study has shown the surface roughness increase at inertial stage but decrease gradually with longer etching time. However, nanostructured surface was decreased with increasing of etching time. From side view measurement, the nanopillar of NPSi becomes smaller size while increase of etching time. The crystallinity of PSi is observed by Raman scattering varied with different etching time. The photoluminescence measurement will be carried out to study the correlation between optical and structural properties.
机译:纳米结构多孔硅(NPSi)是通用的纳米材料,Canham(1990)从NPSi观察到可见发光后在器件应用中的吸引人的领域。 NPSi已经通过电化学技术以硅晶片为基础材料制备。电解质溶液由乙醇和氢氟酸组成,体积比为1:1。改变蚀刻时间,同时固定其他制备参数以产生不同孔隙率的NPSi样品。使用场发射扫描电子显微镜和拉曼光谱仪测量样品的结构性质。表面结构研究表明,表面粗糙度在惯性阶段增加,但随着刻蚀时间的延长逐渐减小。然而,纳米结构的表面随着蚀刻时间的增加而减小。从侧面测量,NPSi的纳米柱尺寸变小,而蚀刻时间增加。通过拉曼散射观察到PSi的结晶度随蚀刻时间的变化而变化。将进行光致发光测量以研究光学和结构性质之间的相关性。

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