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首页> 外文期刊>ECS Journal of Solid State Science and Technology >Electrical Properties and Defect Chemistry of Indium-Doped TiO_2:Electrical Conductivity
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Electrical Properties and Defect Chemistry of Indium-Doped TiO_2:Electrical Conductivity

机译:掺杂铟的TiO_2的电性能和缺陷化学:电导率

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This work reports the electrical conductivity of indium-doped TiO_2 at elevated temperatures (1023 K - 1273 K) and in the gas phase of controlled oxygen activity in the range 10~(-16) Pa(O_2)<10~5 Pa. The effect of indium on charge transport in TiO_2 is considered in terms of the electrical conductivity components related to electrons, electron holes and ions. It is shown that addition of 0.4 at% of indium to TiO_2 results in a shift of the n-p transition point toward lower values of oxygen activity by the factor of about 10. The obtained experimental data in oxidizing conditions are consistent with the mechanism of indium incorporation into the titanium sublattice leading to the formation of acceptor energy levels. However, the determined effect of indium on the ionic conductivity component indicates that indium is incorporated into interstitial sites resulting in the formation of donors. The reported data may be used for processing TiO_2 with controlled properties that are desired for specific applications.
机译:这项工作报告了铟掺杂的TiO_2在高温(1023 K-1273 K)以及在受控氧活度在10〜(-16)Pa (O_2)<10〜5 Pa范围内的气相中的电导率根据与电子,电子空穴和离子有关的电导率成分来考虑铟对TiO_2中电荷传输的影响。结果表明,向TiO_2中添加0.4 at%的铟会导致np转变点向较低的氧活度值移动约10倍。在氧化条件下获得的实验数据与铟掺入的机理一致进入钛亚晶格导致受体能级的形成。然而,铟对离子电导率组分的确定作用表明,铟被掺入到间隙位点中,从而形成了供体。报告的数据可以用于处理具有特定应用所需的受控性质的TiO_2。

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