首页> 外文期刊>International Journal of Photoenergy >Fabrication of Cu-Zn-Sn-S-O Thin Films by the Electrochemical Deposition Method and Application to Heterojunction Cells
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Fabrication of Cu-Zn-Sn-S-O Thin Films by the Electrochemical Deposition Method and Application to Heterojunction Cells

机译:电化学沉积法制备Cu-Zn-Sn-S-O薄膜及其在异质结电池中的应用

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摘要

A new multinary semiconductor Cu_2ZnSnS_(4-x)O_x (CZTSO), which does not contain toxic elements and expensive rare metals, was fabricated by the electrochemical deposition (ECD) method. CZTSO thin films were deposited onto indium tin oxide (ITO-) coated glass substrates by DC and two-step pulsed ECD from aqueous solutions containing CuSO_4, ZnSO_4, SnSO_4, and Na_2S_2O_3. The films deposited by pulsed ECD contained smaller amount of oxygen than those deposited by DC ECD. The films had band gap energies in a range from 1.5 eV and 2.1 eV. By a photoelectrochemical measurement, it was confirmed that CZTSO films showed p-type conduction and photosensitivity. CZTSO/ZnO heterojunctions exhibited rectification properties in a current-voltage measurement.
机译:通过电化学沉积(ECD)方法制备了一种新型的多元半导体Cu_2ZnSnS_(4-x)O_x(CZTSO),它不含有毒元素和昂贵的稀有金属。通过DC和两步脉冲ECD从含CuSO_4,ZnSO_4,SnSO_4和Na_2S_2O_3的水溶液中将CZTSO薄膜沉积到涂有铟锡氧化物(ITO-)的玻璃基板上。通过脉冲ECD沉积的薄膜比通过DC ECD沉积的薄膜含有更少的氧气。所述膜的带隙能在1.5eV至2.1eV的范围内。通过光电化学测量,确认CZTSO膜显示出p型导电性和光敏性。 CZTSO / ZnO异质结在电流-电压测量中显示出整流特性。

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