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Characterization of the Manufacturing Processes to Grow Triple-Junction Solar Cells

机译:生长三结太阳能电池的制造工艺的表征

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A number of important but little-investigated problems connected with III-V/Ge heterostructure in the GaInP/GaInAs/Ge multijunction solar cells grown by MOVPE are considered in the paper. The opportunity for successfully applying the combination of reflectance and reflectance anisotropy spectroscopy in situ methods for investigating III-V structure growth on a Ge substrate has been demonstrated. Photovoltaic properties of the III-V/Ge narrow-band subcell of the triple-junction solar cells have been investigated. It has been shown that there are excess currents in the Ge photovoltaic p-n junctions, and they have the tunneling or thermotunneling character. The values of the diode parameters for these current flow mechanisms have been determined. The potential barrier at the III-V/Ge interface was determined and the origin of this barrier formation during MOVPE heterogrowth was suggested.
机译:本文考虑了与MOVPE生长的GaInP / GaInAs / Ge多结太阳能电池中的III-V / Ge异质结构有关的许多重要但很少研究的问题。已经证明有机会成功地应用反射率和反射率各向异性光谱技术的组合来研究Ge衬底上的III-V结构生长。已经研究了三结太阳能电池的III-V / Ge窄带子电池的光伏性能。已经表明,Ge光伏p-n结中存在过量电流,并且它们具有隧穿或热隧道效应。已经确定了用于这些电流机制的二极管参数的值。确定了III-V / Ge界面的势垒,并提出了MOVPE异质生长过程中这种势垒形成的起源。

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