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首页> 外文期刊>International Journal of Quantum Chemistry >Preparation and self-assembly of copper nanoparticles via discharge of copper rod electrodes in a surfactant solution: a combination of physical and chemical processes
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Preparation and self-assembly of copper nanoparticles via discharge of copper rod electrodes in a surfactant solution: a combination of physical and chemical processes

机译:通过表面活性剂溶液中铜棒电极的放电制备和自组装铜纳米颗粒:物理和化学过程的结合

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Cu nanoparticles with a mean diameter of 10-15 nm were prepared and self-assembled via discharge of bulk copper rods in a cetyltrimethylammonium bromide (CTAB)/ascorbic acid solution. Ascorbic acid was used as a protective agent to prevent the nascent Cu nanoparticles from oxidation in the solution;, otherwise spindle-like Cu2O/CuO structures, with a lateral dimension of 30-50nm and length of up to 100nm, were formed in pure deionized water. The surfactant CTAB had a critical influence on self-assembly of spherical Cu nanostructures (with diameter of 700 nm-1mum). Such a low-temperature and non-vacuum method, exhibiting the characters of both physical and chemical processes, provides a versatile choice for economical preparation and assembly of various metal nanostructures. (C) 2004 Elsevier Inc. All rights reserved.
机译:制备了平均直径为10-15 nm的Cu纳米颗粒,并通过在十六烷基三甲基溴化铵(CTAB)/抗坏血酸溶液中放电散装的铜棒进行自组装。抗坏血酸用作保护剂,以防止新生的铜纳米粒子在溶液中氧化;否则,在纯去离子中形成纺锤状Cu2O / CuO结构,其横向尺寸为30-50nm,长度最大为100nm。水。表面活性剂CTAB对球形Cu纳米结构(直径为700 nm-1mum)的自组装具有关键影响。这样的低温和非真空方法,既显示物理过程又显示化学过程的特征,为各种金属纳米结构的经济制备和组装提供了广泛的选择。 (C)2004 Elsevier Inc.保留所有权利。

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