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首页> 外文期刊>International Journal of Precision Engineering and Manufacturing >Combined Product and Tool Disturbance Estimator for the Mix-Product Process and Its Application to the Removal Rate Estimation in CMP Process
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Combined Product and Tool Disturbance Estimator for the Mix-Product Process and Its Application to the Removal Rate Estimation in CMP Process

机译:混合产品过程中的产品和工具组合干扰估计器及其在CMP过程中去除率估计中的应用

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摘要

In this paper, we proposed a control strategy: Combined Product and Tool Disturbance Estimator (CPTDE) which combines threaded double EWMA with the drift compensation scheme, to adaptively estimate the disturbance for a mix-product situation in semiconductor processes. This approach considers the disturbances are related to the combination of the specific product and the tool, and further separates the error into an intercept term and a drift term, where the former is related to the variation of products, whereas the latter is related to the interaction between the tools and the products. The proposed method continuously updates the intercept and drift terms to obtain the recipe for the next run. The simulation case studies, i.e., the fixed schedule process, the random schedule process, and the periodical schedule process, are conducted and the results show that CPTDE control scheme has best control performance when compared with three recently published control schemes. The method is also applied to the estimation of removal rate in mix-product CMP process. The results show that the proposed method has improvements over product-based EWMA control, CF-EWMA control and threaded PCC control by 9.52%, 2523.43% and 11.71% on average, respectively, for estimating removal rate of historical data in mix-product CMP process.
机译:在本文中,我们提出了一种控制策略:组合产品和工具扰动估计器(CPTDE),它将螺纹双EWMA与漂移补偿方案相结合,以针对半导体工艺中的混合产品情况自适应地估计扰动。这种方法认为干扰与特定产品和工具的组合有关,并且将误差进一步分为拦截项和漂移项,其中前者与产品的变化有关,而后者与产品的变化有关。工具与产品之间的交互。所提出的方法不断更新截距和漂移项以获得下一次运行的配方。进行了仿真案例研究,即固定调度过程,随机调度过程和定期调度过程,结果表明,与最近发布的三种控制方案相比,CPTDE控制方案具有最佳的控制性能。该方法还适用于混合产品CMP工艺中去除率的估计。结果表明,该方法相对于基于产品的EWMA控制,CF-EWMA控制和线程PCC控制分别平均提高了9.52%,2523.43%和11.71%,以估计混合产品CMP中的历史数据去除率处理。

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