FABRICATION OF N-ELECTRODES NANOJUNCTIONS FOR MONOMOLECULAR ELECTRONIC INTERCONNECTS

摘要

A new e-beam nanolithography process is presented to fabricate N-electrodes nano-junctions for the electrical interconnection of a monomolecular circuit having N input/output. The fabricated electrodes of the junction have a width below 20 nm and are buried at the SiO{sub}2 surface. N = 20 of such electrodes can be positioned on a circle of a diameter below 200 nm. An interconnection roadmap for molecular electronics is discussed to put this new process in perspective with the different possible ways of interconnecting a monomolecular circuit via atomic wires, nanotubes or metallic nanowires.