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首页> 外文期刊>International journal of nanoscience >PREPARATION AND CHARACTERIZATION OF ITO THIN FILMS ON GLASS BY A SOL-GEL PROCESS USING METAL SALTS
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PREPARATION AND CHARACTERIZATION OF ITO THIN FILMS ON GLASS BY A SOL-GEL PROCESS USING METAL SALTS

机译:金属盐的溶胶-凝胶法制备和表征玻璃上的ITO薄膜

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摘要

Indium-tin-oxide (ITO) thin film is one of the indispensable materials for advanced optoelectric technologies. In this work, uniform and transparent ITO films were deposited onto glass substrates using a sol-gel method. The initial sols were prepared from anhydrous ethanol solutions of indium nitrate (In(NO{sub}3){sub}3·1H{sub}2O) and tin chloride (SnCl{sub}4), with different In:Sn ratios. The sols were dip-coated on the substrates and were subjected to annealing at different temperatures. Depending on compositions, the electrical resistivity of ITO coating varied from 1.4 × 10{sup}3Ω/□ to 3.5 × 10{sup}3Ω/□, and the minimum value for the electric resistivity was observed for the films containing 8% Sn by weight. Increasing heat treatment-temperatures from 400 to 600℃ led to increase in conductivity by one order of magnitude. The optical transmittance of 550℃-annealed ITO films was more than 90% in the visible region. The morphology of the ITO films was examined by scanning tunneling microscopy (STM) and scanning electron microscopy (SEM). The rms-roughness of 350 nm thick ITO film was 1.5 nm. Increasing film thickness resulted in decrease in both, surface roughness and electrical resistivity. The correlations among the film properties and the film preparation conditions are discussed in detail.
机译:氧化铟锡(ITO)薄膜是先进光电技术必不可少的材料之一。在这项工作中,使用溶胶-凝胶法将均匀且透明的ITO膜沉积在玻璃基板上。初始溶胶是由硝酸铟(In(NO {sub} 3){sub} 3·1H {sub} 2O)和氯化锡(SnCl {sub} 4)的无水乙醇溶液制成的,In:Sn比不同。将溶胶浸涂在基板上,并在不同温度下进行退火。取决于组成,ITO涂层的电阻率从1.4×10 {sup}3Ω/□到3.5×10 {sup}3Ω/□不等,对于含8%Sn的薄膜,其电阻率最小值重量。热处理温度从400℃升高到600℃导致电导率增加一个数量级。 550℃退火的ITO薄膜在可见光区域的透光率大于90%。通过扫描隧道显微镜(STM)和扫描电子显微镜(SEM)检查ITO膜的形态。 350nm厚的ITO膜的均方根粗糙度为1.5nm。膜厚度的增加导致表面粗糙度和电阻率的降低。详细讨论了膜性质和膜制备条件之间的相关性。

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