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首页> 外文期刊>International Journal of Nanotechnology >Nanoscale investigations of switching properties and piezoelectric activity in ferroelectric thin films using piezoresponse force microscopy
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Nanoscale investigations of switching properties and piezoelectric activity in ferroelectric thin films using piezoresponse force microscopy

机译:利用压电响应力显微镜对铁电薄膜的开关特性和压电活性进行纳米级研究

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摘要

With respect to nanoscale ferroelectric thin films research, piezoresponse force microscopy (PFM) for domain imaging and local piezoelectric spectroscopy for switching properties and piezoelectric activity measurements require the control of experimental conditions associated to the experimental set-up. To avoid any misinterpretation of the results, stiffness of the cantilever, or frequency and amplitude of the driving AC voltage have to be carefully investigated. In this paper, optimal working conditions determined with our experimental set-up are described in order to evidence the architecture of domains, to measure the coercive voltage and to evaluate the piezoelectric activity of Pb(Zr, Ti)O{sub}3 thin films. Illustrations are carried out on highly oriented, unetched and ion beam etched tetragonal films; explanations of the behaviour of the ferroelectric material at the nanoscale level are given.
机译:关于纳米级铁电薄膜的研究,用于畴成像的压电响应力显微镜(PFM)和用于开关特性和压电活性测量的局部压电光谱需要控制与实验装置相关的实验条件。为避免对结果产生任何误解,必须仔细研究悬臂的刚度或驱动交流电压的频率和幅度。在本文中,我们描述了通过我们的实验装置确定的最佳工作条件,以证明畴的结构,测量矫顽电压并评估Pb(Zr,Ti)O {sub} 3薄膜的压电活性。插图是在高度取向的,未蚀刻和离子束蚀刻的四边形薄膜上进行的;给出了铁电材料在纳米级行为的解释。

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