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Calculation of electronic properties of SrSi_2 within the framework of a band theory

机译:在能带理论框架内计算SrSi_2的电子性质

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摘要

Results of the electronic property calculations of SrSi_2 using the density-functional theory and the local density approximation with the generalized gradient correction are presented. The calculated structural parameters are in good agreement with the experimental values. The nearest Si-Si bond has a covalent nature. The electron density distribution belonging to the highest valence band (HVB) along this bond has a minimum in the center of this bond while that belonging to the lowest conduction band (LCB) has a maximum in the center of this bond. The calculated energy difference between the bottom of the LCB and the top of the HVB becomes smaller and changes to negative values by decreasing the cell volume. This agrees with the observed gap shrinkage by compression, though the observe gap between the HVB and LCV at ambient pressure could not be reproduced by the present band calculation as in the cases of other polar semiconductors.
机译:给出了利用密度泛函理论和具有广义梯度校正的局部密度近似计算SrSi_2电子性能的结果。计算得到的结构参数与实验值吻合良好。最接近的Si-Si键具有共价性质。沿着该键属于最高价带(HVB)的电子密度分布在该键的中心最小,而属于最低导带(LCB)的电子密度分布在该键的中心最大。 LCB的底部和HVB的顶部之间的计算出的能量差变小,并通过减小单元体积而变为负值。这与通过压缩观察到的间隙收缩是一致的,尽管在环境压力下HVB和LCV之间的观察间隙不能像其他极性半导体的情况那样通过本带计算来再现。

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