Fast deposition of diamond-like and diamond films using a plasmatron with interelectrode inserts

摘要

Data on the deposition of thin wear-resistant diamond-like films (DLFs) and diamond films (DFs) are reported. Films are deposited using the chemical vapor deposition method with the application of a supersonic high-temperature plasma jet generated by a high-enthalpy plasmatron with a sectionalized interelectrode insert and a cold gas curtain of discharge chamber walls. The deposition rate for DLFs and DFs is as high as 30-50 mu m/h. The best results (the absence of the graphite phase in a film) are obtained at the highest degree of ionization of the supersonic plasma jet.