Manufacturing Garnet Ferrite Film Resonators using the Chemical Etching Technique

摘要

A procedure of manufacturing microwave resonators on the basis of epitaxial Y_3Fe_5O_(12) and (Y, Sm, Lu, Ca)_3(Fe, Ge)_5O_(12) garnet ferrites with thicknesses of ≤5 μm, which are grown on gallium - gadolinium garnet substrates, is described. To obtain circular garnet ferrites - resonators with diameters of 0.5-3.0 mm - via chemical etching in orthophosphoric acid at T = 60-175℃, protecting SiO_2, silicon adhesive, and photoresist coatings are used. It is established that the resonators that were manufactured using a protective FP-383 photoresist coating have the narrowest ferromagnetic-resonance line.