METHOD OF MANUFACTURING THIN FILM RESONATOR, AND APPARATUS OF ETCHING THIN FILM RESONATOR

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a thin film resonator by which a desired resonance frequency can be obtained with high accuracy.;SOLUTION: A piezoelectric resonance section 9, in which an upper electrode film 1 and a lower electrode film 2 are formed on both sides of a piezoelectric film 3, is formed on a front side of a Si substrate. Thereafter, etching by a laser beam 11 is carried out to form a cavity part 20. In this case, the etching by the laser beam 11 is carried out by making a detection probe 15 in contact with the upper electrode film 1 and the lower electrode film 2 to monitor the resonance frequency of the thin film resonator and when the resonance frequency is almost coincident with a setting frequency, the etching by the laser beam 11 is completed.;COPYRIGHT: (C)2005,JPO&NCIPI