首页> 外文期刊>Integrated Ferroelectrics >CHARACTERIZATION OF (Ba_(0.5)Sr_(0.5))TiO_3 THIN FILMS DEPOSITED ONTO METALORGANIC CHEMICAL VAPOR DEPOSITED (Ba,Sr)RuO_3 (BSR) SEED LAYERS FOR VOLTAGE TUNABLE DEVICES
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CHARACTERIZATION OF (Ba_(0.5)Sr_(0.5))TiO_3 THIN FILMS DEPOSITED ONTO METALORGANIC CHEMICAL VAPOR DEPOSITED (Ba,Sr)RuO_3 (BSR) SEED LAYERS FOR VOLTAGE TUNABLE DEVICES

机译:用于电压可调装置沉积在(Ba,Sr)RuO_3(BSR)种子层上的(Ba_(0.5)Sr_(0.5))TiO_3薄膜的表征

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摘要

The conducting oxide (Ba,Sr)RuO_3 (BSR), which offered not only the appropriate match in structure but also the chemical compatibility with (Ba,Sr)TiO_3 (BST), was investigated as seed layers to obtain a high tunability and dielectric constant of BST films. The tunability and dielectric constant of the (100) textured BST films abruptly increased with increasing BSR seed layer thickness and showed about 68 percent and 1300 at seed layer of 150A, respectively. Higher tunability and dielectric constant of BST films deposited onto BSR seed layers have been attributed to the suppression of low dielectric layer formation and to the nonexistence of thermal stress by lattice mismatch at BST/Pt interface.
机译:研究了导电氧化物(Ba,Sr)RuO_3(BSR)作为种子层,不仅提供了适当的结构匹配,而且还提供了与(Ba,Sr)TiO_3(BST)的化学相容性,从而获得了高可调性和介电性能BST电影的常数。 (100)织构化的BST膜的可调性和介电常数随BSR种子层厚度的增加而突然增加,并且在150A的种子层处分别显示约68%和1300。沉积在BSR种子层上的BST膜具有更高的可调谐性和介电常数,这归因于抑制了低介电层的形成,以及由于BST / Pt界面处晶格失配导致的热应力不存在。

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