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Influence of annealing temperature on optical properties of fluoride doped tin oxide films grown by the sol-gel spin-coating method

机译:退火温度对溶胶-凝胶旋涂法生长掺氟氧化锡薄膜光学性能的影响

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Fluoride-doped Tin Oxide (FTO) thin films were deposited on glass and silicon substrates by the sol-gel spin-coating method using stannic chloride pentahydrate (SnCl4 center dot 5H(2)O) and ammonium fluoride (NH4F) as starting precursors for Sn and F sources. As-deposited films were annealed at different temperatures ranging from 300-600 degrees C. The effect of annealing temperature on structural and optical properties of FTO thin films including crystallinity, surface morphology, optical transparency, optical reflectivity and optical band gap are investigated by X-ray diffraction, scanning electron microscopy and UV-VIS spectrophotometry. The XRD results suggest that the prominent peak in the (110) orientation can be indexed to the polycrystalline SnO2 structure without any impurity phase caused by fluoride doping. The transmittance spectra of fluoride-doped tin oxide thin films show good transparency in the visible region with noticeable variation in its structural and optical reflectance properties depending on annealing temperature.
机译:通过使用五水合氯化锡(SnCl4中心点5H(2)O)和氟化铵(NH4F)作为起始前体的溶胶-凝胶旋涂方法,在玻璃和硅基板上沉积掺杂氟的氧化锡(FTO)薄膜。锡和氟源。沉积的薄膜在300-600摄氏度的不同温度下退火。退火温度对FTO薄膜的结构和光学性质(包括结晶度,表面形态,光学透明性,光学反射率和光学带隙)的影响。射线衍射,扫描电子显微镜和紫外可见分光光度法。 XRD结果表明,在(110)取向上的突出峰可以被指示为多晶SnO 2结构,而没有由氟化物掺杂引起的任何杂质相。掺杂氟化物的氧化锡薄膜的透射光谱在可见光区域显示出良好的透明性,其结构和光反射特性随退火温度的变化而显着变化。

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