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Influence of Annealing Temperature on Structural and Optical Properties of Undoped and Al-Doped Nano-ZnO Films Prepared by Sol-Gel Method

机译:退火温度对溶胶-凝胶法制备的非掺杂和铝掺杂纳米ZnO薄膜结构和光学性能的影响

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摘要

Undoped and Al-doped nano-ZnO thin films are grown on sapphire substrates by a sol gel method. Their structural, morphological, and optical properties have been investigated with respect to post -annealing temperatures of 500 degrees C and 700 degrees C. The undoped and Al-doped nano-ZnO films exhibit a dominant (002) XRD peak. By increasing the annealing temperature of ZnO from 500 degrees C to 700 degrees C, the homogeneously distributed granular nano-grains with 20-40 nm diameter are changed into faceted grains with 30-80 nm. The photoluminescence spectra show strong emission peak around 3.26 eV indicating a direct band gap recombination. ascribed to free exiton emission. The Raman spectra exhibit a strong A(1) (LO) peak and its shift with increasing annealing temperature due to strain of undoped and Al-doped ZnO thin films concurs with the broadening of XRD peak.
机译:通过溶胶凝胶法在蓝宝石衬底上生长未掺杂和铝掺杂的纳米ZnO薄膜。已经针对500摄氏度和700摄氏度的退火后温度研究了它们的结构,形态和光学性质。未掺杂和铝掺杂的纳米ZnO薄膜表现出主要的(002)XRD峰。通过将ZnO的退火温度从500摄氏度提高到700摄氏度,将直径20-40 nm的均匀分布的颗粒状纳米颗粒转变为30-80 nm的切面晶粒。光致发光光谱显示出在3.26 eV附近的强发射峰,表明存在直接的带隙重组。归因于自由出口发射。拉曼光谱表现出很强的A(1)(LO)峰,并且由于未掺杂和Al掺杂的ZnO薄膜的应变而导致的退火温度升高引起的位移与XRD峰的扩展一致。

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