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首页> 外文期刊>Integrated Ferroelectrics >IMPROVEMENT OF THE DEGRADATION CHARACTERISTICS OF SOL-GEL DERIVED PZT (53/47) THIN FILMS: EFFECT OF CONVENTIONAL AND GRADED IRON DOPING
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IMPROVEMENT OF THE DEGRADATION CHARACTERISTICS OF SOL-GEL DERIVED PZT (53/47) THIN FILMS: EFFECT OF CONVENTIONAL AND GRADED IRON DOPING

机译:溶胶-凝胶法制备的PZT(53/47)薄膜的降解特性的改进:常规和梯度铁掺杂的影响

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摘要

Several approaches are evident in the literature to improve the fatigue resistance and lower the leakage current densities of PZT thin films for nonvolatile random access memory (NVRAM) application. We have undertaken an approach of doping (conventional and graded) of PZT (53/47) thin films with Fe cation, which tend to occupy B-site in the ABO_3 unit cell. Our studies indicated several improvements in the electrical characteristics. The graded doped Fe film of similar dopant concentrations exhibited even better fatigue behavior up to approx 10~9 cycles. In addition, the Ohmic behavior in I-V characterization extended up to 250 kV/cm for graded doped films, while the non-linearity sets at much lower field (150kV/cm) for undoped films at room temperature. Conventional doping improved the electrical behavior as compared to undoped films. However, the graded doped films exhibited even further improved electrical behavior in terms of reducing leakage current by at least an order of magnitude under an applied electric fields of about 150 kV/cm.
机译:在文献中明显有几种方法可以改善用于非易失性随机存取存储器(NVRAM)应用的PZT薄膜的抗疲劳性并降低其漏电流密度。我们采取了一种用铁阳离子对PZT(53/47)薄膜进行掺杂(常规和渐变)的方法,该膜倾向于在ABO_3晶胞中占据B位。我们的研究表明,在电气特性方面有一些改进。具有相似掺杂剂浓度的梯度掺杂Fe膜在约10〜9个循环内表现出更好的疲劳性能。此外,梯度掺杂膜的I-V表征中的欧姆行为扩展至250 kV / cm,而室温下非掺杂膜的非线性场强低得多(150kV / cm)。与未掺杂的薄膜相比,常规的掺杂改善了电性能。然而,就在约150kV / cm的施加电场下将漏电流减小至少一个数量级而言,梯度掺杂膜表现出甚至进一步的改善的电性能。

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