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首页> 外文期刊>Atmospheric Measurement Techniques >HOx radical chemistry in oxidation flow reactors with low-pressure mercury lamps systematically examined by modeling
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HOx radical chemistry in oxidation flow reactors with low-pressure mercury lamps systematically examined by modeling

机译:通过建模系统地检查了带有低压汞灯的氧化流反应器中的HOx自由基化学

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摘要

Oxidation flow reactors (OFRs) using OH produced from low-pressure Hg lamps at 254 nm (OFR254) or both 185 and 254 nm (OFR185) are commonly used in atmospheric chemistry and other fields. OFR254 requires the addition of externally formed O-3 since OH is formed from O-3 photolysis, while OFR185 does not since O-2 can be photolyzed to produce O-3, and OH can also be formed from H2O photolysis. In this study, we use a plug-flow kinetic model to investigate OFR properties under a very wide range of conditions applicable to both field and laboratory studies. We show that the radical chemistry in OFRs can be characterized as a function of UV light intensity, H2O concentration, and total external OH reactivity (OHRext, e.g., from volatile organic compounds (VOCs), NOx, and SO2). OH exposure is decreased by added external OH reactivity. OFR185 is especially sensitive to this effect at low UV intensity due to low primary OH production. OFR254 can be more resilient against OH suppression at high injected O-3 (e.g., 70 ppm), as a larger primary OH source from O-3, as well as enhanced recycling of HO2 to OH, make external perturbations to the radical chemistry less significant. However if the external OH reactivity in OFR254 is much larger than OH reactivity from injected O-3, OH suppression can reach 2 orders of magnitude. For a typical input of 7 ppm O-3 (OHRO3 D = 10 s(-1)), 10-fold OH suppression is observed at OHRext similar to 100 s(-1), which is similar or lower than used in many laboratory studies. The range of modeled OH suppression for literature experiments is consistent with the measured values except for those with isoprene. The finding on OH suppression may have important implications for the interpretation of past laboratory studies, as applying OHexp measurements acquired under different conditions could lead to over a 1-order-of-magnitude error in the estimated OHexp. The uncertainties of key model outputs due to uncertainty in all rate constants and absorption cross-sections in the model are within +/- 25% for OH exposure and within +/- 60% for other parameters. These uncertainties are small relative to the dynamic range of outputs. Uncertainty analysis shows that most of the uncertainty is contributed by photolysis rates of O-3, O-2, and H2O and reactions of OH and HO2 with themselves or with some abundant species, i.e., O-3 and H2O2. OHexp calculated from direct integration and estimated from SO2 decay in the model with laminar and measured residence time distributions (RTDs) are generally within a factor of 2 from the plug-flow OHexp. However, in the models with RTDs, OHexp estimated from SO2 is systematically lower than directly integrated OHexp in the case of significant SO2 consumption. We thus recommended using OHexp estimated from the decay of the species under study when possible, to obtain the most appropriate information on photochemical aging in the OFR. Using HOx recycling vs. destructive external OH reactivity only leads to small changes in OHexp under most conditions.
机译:使用从低压汞灯在254 nm(OFR254)或185和254 nm(OFR185)产生的OH产生的氧化流反应器(OFR)通常用于大气化学和其他领域。 OFR254需要添加外部形成的O-3,因为OH是由O-3光解形成的,而OFR185则不是,因为O-2可以被光解生成O-3,OH也可以由H2O光解形成。在这项研究中,我们使用塞流动力学模型来研究适用于现场和实验室研究的非常广泛的条件下的OFR特性。我们表明,OFR中的自由基化学性质可以表征为UV光强度,H2O浓度和总外部OH反应性的函数(OHRext,例如来自挥发性有机化合物(VOC),NOx和SO2)。通过增加外部OH反应性可以减少OH暴露。由于初级OH生成量低,因此OFR185在低UV强度下对该效果特别敏感。 OFR254在高注入量O-3(例如70 ppm)下对OH抑制具有更强的抵抗力,因为来自O-3的较大的主要OH源以及增强的HO2循环至OH的能力,使得对自由基化学的外部干扰较小重大。但是,如果OFR254中的外部OH反应性比注入的O-3的OH反应性大得多,则OH抑制可达到2个数量级。对于典型的7 ppm O-3输入(OHRO3 D = 10 s(-1)),在OHRext上观察到的10倍OH抑制类似于100 s(-1),这与许多实验室中使用的相似或更低。学习。文献实验中模拟的OH抑制范围与除异戊二烯外的测量值一致。关于OH抑制的发现可能对过去的实验室研究的解释具有重要意义,因为应用在不同条件下获得的OHexp测量值可能导致估计的OHexp超过1个数量级的误差。由于模型中所有速率常数和吸收截面的不确定性,关键模型输出的不确定性对于OH暴露在+/- 25%以内,对于其他参数在+/- 60%以内。相对于输出的动态范围,这些不确定性很小。不确定性分析表明,大多数不确定性是由O-3,O-2和H2O的光解速率以及OH和HO2与它们自身或与某些丰富的物种(即O-3和H2O2)的反应引起的。在具有层流的模型中,通过直接积分计算得出的OHexp值,以及从模型中的SO2衰减估算出的OHexp值和测得的停留时间分布(RTD),通常比塞流OHexp差2倍。但是,在具有RTD的模型中,在大量消耗SO2的情况下,根据SO2估算的OHexp系统上低于直接积分的OHexp。因此,我们建议在可能的情况下,使用从研究中物种的衰变估计的OHexp来获得关于OFR中光化学老化的最适当信息。在大多数情况下,使用HOx回收与破坏性的外部OH反应性只会导致OHexp的微小变化。

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