Fabrication of microprisms for planar optical interconnections by use of analog gray-scale lithography with high-energy-beam-sensitive glass

摘要

For an integrated free-space optical interconnection system we suggest the use of microprisms to achieve large coupling angles at low loss. Prisms were fabricated in photoresist and quartz glass by analog lithography. High-energy-beam-sensitive glass was used as the gray-tone mask. Optical testing of the prisms shows acceptable surface quality and high efficiency (95%).