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Modeling and measurements of atomic surface roughness

机译:原子表面粗糙度的建模和测量

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摘要

We present a geometrical model of atomic topography with which to obtain a quantitative assessment of surface roughness. A series of two- and three-dimensional atomic surface roughness equations with sufficiently realistic parameters is developed to permit quantitative comparison with scanning-tunneling microscope and atomic-force microscope (AFM) experimental results. The model is sufficiently simple that one can easily use it to interpret experimental data. Tables are provided with estimated values for two- and three-dimensional rms atomic surface roughness in pure metal crystals and ionic crystals based on the atomic surface roughness equations. We use these roughness equations to determine the roughness of cleaved muscovite mica [essentially, KAl_(2)(OH)_(2)Si_(3)AlO_(10)]; the calculated values for both two- and three-dimensional roughness are consistent with those obtained in our AFM measurements. In addition, we demonstrate both theoretically and experimentally that atomic surface roughness is never zero.
机译:我们提出了一种原子形貌的几何模型,利用该模型可以对表面粗糙度进行定量评估。建立了一系列具有足够实际参数的二维和三维原子表面粗糙度方程,以便与扫描隧道显微镜和原子力显微镜(AFM)实验结果进行定量比较。该模型非常简单,可以轻松地使用它来解释实验数据。根据原子表面粗糙度方程,为表提供了纯金属晶体和离子晶体中二维和三维rms原子表面粗糙度的估计值。我们使用这些粗糙度方程来确定解理的白云母云母的粗糙度[基本上是KAl_(2)(OH)_(2)Si_(3)AlO_(10)];二维和三维粗糙度的计算值与我们的AFM测量获得的值一致。另外,我们在理论和实验上都证明原子表面粗糙度永远不会为零。

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