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Near infrared broadband emission of In_(0.35)Ga_(0.65)As quantum dots on high index GaAs surfaces

机译:近红外宽带发射的In_ Ga_(0.35)(0.65)量子点在高指数砷化镓表面

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摘要

The morphology and optical properties of In_(0.35)Ga_(0.65)As/GaAs quantum dots (QDs) grown on (210), (311)A, (711)A, (731) and (100) substrates are investigated. QDs formed on (210) and (731) oriented substrates are grown by molecular beam epitaxy. Regular QDs are observed on (100), (311)A, and (711)A. Randomly distributed QDs and comet-shaped QDs form on (210) and (731) substrates, respectively. A high density of QDs on the order of 10~(11) cm~(-2) are obtained from (711) A. The optical measurement shows a spectrum linewidth (FWHM = 74.3 nm) of QDs on GaAs (210) three times wider than GaAs (100) substrate. Long exciton decay times, over 1 ns, are also measured by time-resolved photo-luminescence technique for all samples. Our results demonstrate the potential for QDs on GaAs high index substrates for wideband applications.
机译:的形态和光学性质In_ Ga_(0.35)(0.65) /砷化镓量子点(量子点)生长在(210),(311),(711),(731)和(100)基板。和(731)的基质是增长了分子束外延。(100)、(311)和(711)。分布式量子点和量子点带形式分别为(210)和(731)基板。量子点密度的10 ~(11)厘米~ (2)从(711)a是光吗测量显示了谱线宽=(的半最大值宽度量子点74.3海里)在砷化镓(210)的三倍大比砷化镓衬底(100)。乘以,除以1 ns,也是衡量时间分辨photo-luminescence技术所有的样品。量子点的潜力在砷化镓高指数基板对宽带应用。

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