Metal nanowire grating patterns

摘要

Metal nanowire patterning in the form of grating structures has been carried out using a wide range of lithography techniques, and many hybrid methods derived from them. The challenge is to achieve sub-100 nm linewidths with controllable spacing and thickness over large areas of substrates with high throughput. In particular, the patterns with linewidth and spacing of a few tens of nm offer properties of great interest in optoelectronics and plasmonics. Crossbar grating structures-two gratings patterned perpendicular to each other-will play an important role as ultra-high density electrode grids in memristive devices for non-volatile memory.