NANOWIRE, NANOWIRE GRID STRUCTURE, AND METHOD FOR MANUFACTURING NANOWIRE

摘要

The present invention relates to a method for manufacturing a nanowire. The method includes steps of forming a plurality of grid patterns on a substrate, forming a sacrificial layer on the grid patterns, forming a nanowire base layer which has at least one blackening layer on the grid patterns with the sacrificial layer, and separating the nanowire base layer from the grid patterns by etching the sacrificial layer. According to the present invention, the method can mass-produce nanowires at low costs and can improve the visibility of a display device when the produced nanowires are applied to a transparent electrode.;COPYRIGHT KIPO 2014;[Reference numerals] (AA) Start; (BB) End; (S10) Step for forming a plurality of grid patterns on a substrate; (S30) Step for forming a sacrificial layer on the grid patterns; (S50) Step for forming a nanowire base layer which has at least one blackening layer on the grid patterns with the sacrificial layer; (S70) Step for separating the nanowire base layer by etching the sacrificial layer; (S90) Step for separating nanowires from the nanowire base layer