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Electrochemical evaluation of a novel boron doped diamond (BDD) material for application as potential electrochemical capacitor

机译:新型硼掺杂金刚石(BDD)材料作为潜在电化学电容器的电化学评估

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Highly boron doped chemical vapor deposition (CVD) polycrystalline diamond plates have been crushed under high pressure to produce a sintered mass boron doped diamond sheet with an approximate doping level of 10~(18-21) atoms/cm~3. The electrochemical performance of the sintered mass CVD boron doped diamond material (SM-BDD) was evaluated for suitability as a material for the design of electrical double-layer capacitors. The SM-BDD material was characterized by scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX), and Fourier transform infrared spectroscopy (FTIR). The SEM confirmed the high degree of surface roughness and increased surface area compared to commercial polycrystalline BDD. The EDX and FTIR confirmed the presence of boron doping. Cyclic voltammetry (CV) revealed that the SM-BDD displayed the classical rectangular cyclic voltammogram associated with highly capacitive materials. Electrochemical impedance spectroscopy (EIS) equivalent circuit fitting data was used to calculate the specific energy for the SM-BDD to be in the range 1.3-1.8W h/kg, which is typical for electrochemical capacitors.
机译:已经在高压下将高硼掺杂的化学气相沉积(CVD)多晶金刚石板压碎,以生产出具有约10〜(18-21)原子/ cm〜3的掺杂水平的烧结质量的硼掺杂金刚石片。评价烧结质量的CVD掺杂硼的金刚石材料(SM-BDD)的电化学性能是否适合作为双电层电容器设计的材料。 SM-BDD材料通过扫描电子显微镜(SEM),能量色散X射线光谱(EDX)和傅立叶变换红外光谱(FTIR)进行表征。 SEM证实与商业多晶BDD相比,其具有较高的表面粗糙度和增加的表面积。 EDX和FTIR证实存在硼掺杂。循环伏安法(CV)显示,SM-BDD显示了与高电容材料相关的经典矩形循环伏安图。使用电化学阻抗谱(EIS)等效电路拟合数据来计算SM-BDD的比能在1.3-1.8W h / kg的范围内,这是电化学电容器的典型值。

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