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首页> 外文期刊>ACS nano >Enhancement of Out-of-Plane Charge Transport in a Vertically Stacked Two-Dimensional Heterostructure Using Point Defects
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Enhancement of Out-of-Plane Charge Transport in a Vertically Stacked Two-Dimensional Heterostructure Using Point Defects

机译:使用点缺陷,增强平面外电荷运输在垂直堆叠的二维异质结构中

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摘要

Point defects in 2D materials block in-plane charge transport, which incurs negative effects on the photoresponse of 2D monolayer materials. In contrast to in-plane charge transport, we show that out-of-plane charge transport in 2D materials can be enhanced through controllable formation of point defects, thus enhancing the photoresponse of a vertical heterostructure. Graphene and WSe2 monolayers were stacked together to construct a vertical heterostructure (W/G). Se point defects were artificially formed on the top atomic layer of WSe2 with controllable density via Ga ion irradiation. The interlayer charge transport in the W/G heterostructure was detected with femtosecond optical probe-pump measurements and photoelectric detection. Our experiments show that point defects can be used to provide higher transfer rate for out-of-plane charge transport and more electronic states for photoexcitation, leading to enhanced photoinduced interlayer charge transfer from WSe2 to graphene. Based on this feature, a photodetector based on W/G modified by point defects is proposed and implemented, exhibiting a fast photoresponsivity (similar to 0.6 ms) (2 orders of magnitude larger than the photoresponse in pristine W/G). This work demonstrates that out-of-plane charge transport is enhanced by the presence of point defects and illustrates an efficient method to optimize the performance of photoelectric devices based on vertical heterostructures.
机译:在2D材料块中的点缺陷在平面内电荷传输,其引起了对2D单层材料的光响应的负面影响。与面内电荷传输相比,我们表明,通过可控制的点缺陷的可控形成,可以提高2D材料中的平面外电荷传输,从而增强垂直异质结构的光响应。将石墨烯和WSE2单层堆叠在一起以构建垂直异质结构(w / g)。在WSE2的顶部原子层上具有通过GA离子照射的可控密度的硒缺陷。用飞秒光学探针泵测量和光电检测检测W / G异质结构中的层间电荷传输。我们的实验表明,点缺陷可用于提供更高的平面电荷运输和更多电子状态用于光透射的传输速率,导致从WSE2增强从WSE2到石墨烯的光导夹层电荷转移。基于该特征,提出并实现了基于点缺陷修改的W / G的光电探测器,表现出快速的光反应性(类似于0.6毫秒)(比原始w / g中的光响应大2的数量级)。这项工作表明,通过存在点缺陷,通过存在点缺陷来增强平面外电荷传输,并说明了基于垂直异质结构优化光电器件性能的有效方法。

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