Adsorption of silica colloids onto like-charged silica surfaces of different roughness

R. Dylla-Spears; L. Wong; N. Shen; W. Steele; J. Menapace; P. Miller; M. Feit; T. Suratwala

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Adsorption of silica colloids onto like-charged silica surfaces of different roughness

机译：将二氧化硅胶体吸附到不同粗糙度的类似二氧化硅表面上

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? QCM-D sensors can successfully be roughened by optical finishing techniques.

? Roughness increase from 1.3nm to 2.7nm boosts 50-nm SiO2 colloid adsorption by 3x.

? Roughness scale relative to adsorbate size plays a role in adsorption outcome.

Abstract

机译：<！[cdata [

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？ QCM-D传感器可以通过光学精加工成功地粗糙化。？ Roug HNY从1.3增加 NM至2.7 NM升压50-NM SIO 2 胶体吸附3x。

？相对于吸附大小的粗糙度比例在吸附结果中起作用。

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来源
《Colloids and Surfaces, A. Physicochemical and Engineering Aspects》 |2017年第2017期|共12页
作者
R. Dylla-Spears; L. Wong; N. Shen; W. Steele; J. Menapace; P. Miller; M. Feit; T. Suratwala;
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作者单位

Lawrence Livermore National Laboratory;

Lawrence Livermore National Laboratory;

Lawrence Livermore National Laboratory;

Lawrence Livermore National Laboratory;

Lawrence Livermore National Laboratory;

Lawrence Livermore National Laboratory;

Lawrence Livermore National Laboratory;

Lawrence Livermore National Laboratory;

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原文格式 PDF
正文语种 eng
中图分类胶体化学（分散体系的物理化学）;
关键词
Colloidal silica; Adsorption; QCM; DLVO theory; Surface roughness; Polishing;

机译：胶体二氧化硅;吸附;QCM;DLVO理论;表面粗糙度;抛光;

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8. Adsorption of silica colloids onto like-charged silica surfaces of different roughness [O] . R. Dylla-Spears, L. Wong, N. Shen, 2017

机译：将二氧化硅胶体吸附到不同粗糙度的类似二氧化硅表面上

Adsorption of silica colloids onto like-charged silica surfaces of different roughness

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