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首页> 外文期刊>Colloids and Surfaces, A. Physicochemical and Engineering Aspects >Amino acid-type photo-cleavable surfactants: Controlled dispersion stability of silica particles and release of active ingredients
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Amino acid-type photo-cleavable surfactants: Controlled dispersion stability of silica particles and release of active ingredients

机译:氨基酸型光切割表面活性剂:二氧化硅颗粒的受控分散稳定性和活性成分的释放

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摘要

We synthesized amino acid-type photo-cleavable surfactants composed of coumarin and glycine precursors and studied the photo-switchable interfacial properties, release of active ingredients, and colloidal stability of silica particles. Photo-cleavage of the surfactants reduced their interfacial activities at the squalane/water interface. Silica particles bearing aminoethylene groups on the surface were well dispersed in an aqueous solution of the photo-cleavable anionic surfactant. The surfactants form a bilayer on the silica particles by ion complexation of the amine and carboxylic groups, and the negative charge originating from the surfactant results in electrostatic repulsion, which contributes to the dispersion stability. Ultraviolet light irradiation caused flocculation of the silica particles and the release of the coumarin derivative and glycine into the medium through photo-induced isomerization and cyclization. The new photo-cleavable surfactant systems represented controlled multiple interfacial and colloidal properties upon photoirradiation.
机译:我们合成由香豆素和甘氨酸前体组成的氨基酸型光切割表面活性剂,并研究了光可切换界面性质,释放活性成分,以及二氧化硅颗粒的胶体稳定性。表面活性剂的照片切割减少了Squalane /水界面的界面活动。在表面上携带亚氨基乙烯基的二氧化硅颗粒良好地分散在光可切割的阴离子表面活性剂的水溶液中。表面活性剂通过胺和羧基的离子络合在二氧化硅颗粒上形成双层,并且源自表面活性剂的负电荷导致静电排斥,这有助于分散稳定性。紫外线照射引起二氧化硅颗粒的絮凝和香豆素衍生物和甘氨酸的释放通过光诱导的异构化和环化。新的光切割表面活性剂系统在光辐射时代表了控制多个界面和胶体特性。

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