...
首页> 外文期刊>Chemistry of Materials: A Publication of the American Chemistry Society >Impurity-Controlled Crystal Growth in Low-Dimensional Bismuth Telluride
【24h】

Impurity-Controlled Crystal Growth in Low-Dimensional Bismuth Telluride

机译:低维铋中的杂质控制的晶体生长

获取原文
获取原文并翻译 | 示例
           

摘要

Topological insulators, such as layered Bi_(2)Te_(3), exhibit extraordinary properties, manifesting profoundly only at nanoscale thicknesses. However, it has been challenging to synthesize these structures with controlled thicknesses. Here, control over the thickness of solvothermally grown Bi_(2)Te_(3) nanosheets is demonstrated by manipulating the crystal growth through select and controlled impurity atom addition. By a comprehensive analysis of the growth mechanism and intentional addition of Fe impurity, we demonstrate that the nucleation and growth of few-layer nanosheets of Bi_(2)Te_(3) can be stabilized in solution. Via optimization of the Fe concentration, nanosheets thinner than 6 nm, and as thin as 2 nm, can be synthesized. Such thicknesses are smaller than the anticipated critical thickness for the transition of topological insulators to the quantum spin Hall regime.
机译:拓扑绝缘体,如分层Bi_(2)TE_(3),表现出非凡的性质,仅在纳米级厚度下表现出深刻的。 然而,通过控制厚度合成这些结构一直挑战。 这里,通过通过选择和控制的杂质原子加入操纵晶体生长来证明对溶剂热生长的Bi_(2)TE_(3)纳米晶片的厚度的控制。 通过综合分析生长机制和有意添加的Fe杂质,我们证明了在溶液中可以稳定含有少层纳米胸的成核和生长。 通过Fe浓度的优化,可以合成纳米液薄于6nm,薄为2nm,可以合成。 这种厚度小于拓扑绝缘体过渡到量子旋转霍尔制度的预期临界厚度。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号