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机译:LTCC基板上生长的多晶GaN / ALN层的综合(S)TEM表征
Univ Cadiz IMEYMAT Inst Res Electron Microscopy &
Mat Cadiz Spain;
Univ Cadiz IMEYMAT Inst Res Electron Microscopy &
Mat Cadiz Spain;
Tech Univ Ilmenau Inst Mikro &
Nanotechnol MacroNano D-98693 Ilmenau Germany;
Tech Univ Ilmenau Inst Mikro &
Nanotechnol MacroNano D-98693 Ilmenau Germany;
Univ Cadiz IMEYMAT Inst Res Electron Microscopy &
Mat Cadiz Spain;
Tech Univ Ilmenau Inst Mikro &
Nanotechnol MacroNano D-98693 Ilmenau Germany;
Tech Univ Ilmenau Inst Mikro &
Nanotechnol MacroNano D-98693 Ilmenau Germany;
Tech Univ Ilmenau Inst Mikro &
Nanotechnol MacroNano D-98693 Ilmenau Germany;
Univ Cadiz IMEYMAT Inst Res Electron Microscopy &
Mat Cadiz Spain;
Low temperature cofired ceramic; Hybrid materials; Gallium nitride; Aluminum nitride; Electron microscopy;
机译:LTCC基板上生长的多晶GaN / ALN层的综合(S)TEM表征
机译:通过MOCVD表征蓝宝石衬底上生长的AlN缓冲层和厚GaN层
机译:通过MOCVD表征蓝宝石衬底上生长的AlN缓冲层和厚GaN层
机译:在具有多个AlN缓冲层的各种生长温度的Si(111)衬底上生长的GaN膜的表征
机译:用于未来III-氮化物生长的氢化物气相外延生长GaN衬底的表征
机译:应变松弛对在具有溅射AlN成核层的4英寸蓝宝石衬底上生长的InGaN / GaN绿色LED的性能的影响
机译:通过MOCVD表征蓝宝石衬底上生长的AlN缓冲层和厚GaN层