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首页> 外文期刊>Analog Integrated Circuits and Signal Processing >High frequency channel noise measurement and characterization in deep submicron MOSFETs
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High frequency channel noise measurement and characterization in deep submicron MOSFETs

机译:深亚微米MOSFET中的高频通道噪声测量和表征

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摘要

We evaluate and compare several closed form expressions of channel thermal noise used in circuits with MOSFET devices operating at high frequencies. To verify and compare these models, NMOS devices with channel widths of 120 μm (20 μm * 6 fingers) and channel lengths of 0.18, 0.36, and 0.54 μm were tested. A comparison of extracted and calculated noise data indicates that a model based on drain and overdrive voltages of short channel devices operating at RF frequencies provides the best match between extracted and calculated results for the channel thermal noise over a frequency range of 3 to 6 GHz and a gate overdrive voltage range of 0.2 to 1.2 V.
机译:我们评估和比较在高频下工作的MOSFET器件的电路中使用的通道热噪声的几种闭合形式。为了验证和比较这些模型,测试了NMOS器件,其沟道宽度为120μm(20μm* 6指),沟道长度为0.18、0.36和0.54μm。提取和计算的噪声数据的比较表明,基于在RF频率下工作的短通道设备的漏极和过驱动电压的模型在3至6 GHz频率范围内的通道热噪声的提取和计算结果之间实现了最佳匹配。栅极过驱动电压范围为0.2至1.2 V.

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