首页> 外文期刊>日本化学会誌. 化学と工业化学 >Bis[4-(N,N-di-p-tolylamino)phenyl]Chalcogenides—Synthesis of Novel Hole Transport Materials Containing Chalcogen Atom and Their Application to Organic Electroluminescence Devices—
【24h】

Bis[4-(N,N-di-p-tolylamino)phenyl]Chalcogenides—Synthesis of Novel Hole Transport Materials Containing Chalcogen Atom and Their Application to Organic Electroluminescence Devices—

机译:双[4-(n,N-Di-p-丙氨酸氨基)苯基]硫代硅酸盐 - 合成含有硫代原子原子的新型空穴传输材料及其在有机电致发光器件中的应用 -

获取原文
获取原文并翻译 | 示例
           

摘要

The title novel hole transport materials (HTM) (1—3) have been synthesized in good yields by the modified Ullmann coupling reaction of the corresponding bis (4—aminophenyl) chalcogenides with p—io-dotoluene in the presence of Cu, K2C03 and 18—crown—6 in o—dichlorobenzene. From the electrochemical and spectroscopic measurements, it was evaluated that the HOMO levels of these materials are nearly the same as that of TPD, the most typical hole transport material, while the LUMO levels are fairly higher. Electroluminescence devices with the layer structure ITO ‘HTM (50 nm) /Alq3 (50 nm) /A1 (500 nm) were fabricated by successive vapor deposition of the materials under vacuum onto an ITO—coated glass. All the devices utilizing 1—3 emitted green light from Alq~ and showed higher luminous efficiency than the device using TPD. In particular, the highest luminance of 2298 cd/in2 was observed for the device of the sulfide—derivative (1).
机译:通过在Cu,K 2 CO 3的存在下,通过相应的双(4-氨基苯基)硫代甲苯的改性的ULLmann偶联剂,在Cu,K 2 CO 3和Cu-dotoluene的情况下,通过改性的Ullmann偶联反应得到了良好的产量来合成标题新的空穴传输材料(HTM)(1-3)。 18-冠-6在O-二氯苯中。 从电化学和光谱测量中,评价这些材料的HOMO水平与TPD,最典型的空穴传输材料的同性量几乎相同,而LUMO水平相当较高。 具有层结构ITO'HTM(50nm)/ Alq3(50nm)/ A1(50nm)的电致发光器件通过在真空中的逐次沉积到ITO涂覆的玻璃上进行逐次气相沉积来制造。 所有使用1-3发射的绿灯的所有设备都与使用TPD的设备显示出更高的发光效率。 特别地,对于硫化物 - 衍生物(1)的装置,观察到2298cd / In2的最高亮度。

著录项

  • 来源
  • 作者单位

    Faculty of Engineering Hiroshima University;

    Highashi-Hiroshima-shi 73-8527 Japan;

    Institute for Fundmental Research of Organic Chemistry Kyushiu University;

    Fukuoka-shi 812-8581 Japan;

    Faculty of Engineering Hiroshima University;

    Highashi-Hiroshima-shi 73-8527 Japan;

    Faculty of Engineering Hiroshima University;

    Highashi-Hiroshima-shi 73-8527 Japan;

    Present address:Faculty of Science and Engineering Saga University;

    Saga-shi 840-8502 Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 jpn
  • 中图分类 化学;化学工业;
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号