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Fabrication and Analysis of the Current Transport Mechanism of Ni/n-GaN Schottky Barrier Diodes through Different Models

机译:制作 和Ni 的 电流输运 机理 的 分析 / n型GaN 肖特基势垒二极管 通过不同的 模式

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摘要

The current transport mechanism of indigenously fabricated Ni/n-GaN Schottky barrier diodes (SBDs) has been analysed using the current-voltage (I-V) and capacitance-voltage (C-V) measurements. Various models like Rhoderick's method, Cheung's method, Norde's method, modified Norde's method, Hernandez's method, and Chattopadhyay's method have been used to extract the different electric parameters from the I-V curve. A comparison has been made between the various electrical parameters such as ideality factor, barrier height, and series resistance, which are extracted from the forward bias I-V curve of Ni/n-GaN SBDs. The carrier concentration of the substrate and the barrier height is obtained from C-V characteristics of Ni/n-GaN SBDs. We observe from the reverse current characteristics that the Ni/n-GaN SBDs show the dominance of Schottky emission in intermediate and higher voltages.
机译:使用电流 - 电压(I-V)和电容 - 电压(C-V)测量,分析了本发明制造的Ni / N-GaN肖特基势垒二极管(SBD)的电流传输机理。 各种型号,如rhoderick的方法,祥的方法,norde的方法,修改的norde方法,hernandez方法和chattopadhyay方法已被用于从I-V曲线中提取不同的电参数。 已经在诸如理想因子,屏障高度和串联电阻的各种电气参数之间进行了比较,其从Ni / N-GaN SBD的正向偏置I-V曲线提取。 基材的载体浓度和阻挡高度从Ni / N-GaN SBD的C-V特性获得。 我们观察到NI / N-GaN SBDS在中间和较高电压中显示肖特基排放的优势的反向电流特性。

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