Fabrication of Cu-O Thin Films by Galvanostatic Electrochemical Deposition from Weakly Acidic Solutions

摘要

Cu-O thin films are deposited at low pH (< 6), low and high temperatures (10°C and 60°C) using the cathodic electrochemical deposition method. The effects of the deposition current densities are studied in a range including current densities high enough to electrolyze water and generate hydrogen bubbles. The influences of deposition variables on film composition, structural, morphological and optical properties are investigated. Auger electron spectroscopy results show fabrication of both Cu_2O and CuO, which is consistent with the results of Raman spectroscopy. X-ray diffraction patterns show (111) and (220) peaks related to Cu_2O for the samples deposited at 60°C, whereas the samples deposited at the low temperature are almost amorphous.