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FABRICATION OF YSZ THIN FILMS IN AN AQUEOUS SOLUTION BY ELECTROCHEMICAL DEPOSITION

机译:通过电化学沉积在水溶液中制造YSZ薄膜

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In our present study, YSZ thin films were fabricated on glass substrates in an aqueous complex solution by electro-chemical deposition. Zirconia is very important for their many characters, and we aim to make their thin films for large area and homogeneous thickness by using environment friendly materials and low cost method. Composition and concentration of the precursor aqueous solution is 94mol%ZrO{sub}2-6mol%YO{sub}1.5 and 0.073 mol/dm{sup}3 (YSZ solution). ZrO(NO{sub}3){sub}2-2H{sub}2O and Y(NO{sub}3){sub}3-6H{sub}2O were used Zr and Y sources. Ammonia solution in appropriate quantities (0-0.5 vol%) was added to adjust the acidity and to occur a radical exchange reaction between ZrO(NO{sub}3){sub}2 and NH{sub}4OH to produce an intermediate form of ZrO(OH){sub}2. After the mixture was stirred for 1 h in an ice bath, a homogeneous colorless and transparent solution was obtained. YSZ thin film was deposited on the glass substrate which was placed on the carbon electrode by applying the voltage 2.0-4.5V for 300s. As-deposited films were flat and transparent but amorphous and so heat-treated at temperature 573-773K for 1 h afterwards. From XRD patterns of the films, the peaks of YSZ were observed at samples annealed at 673, 773 K. After this heat treatment, transparent, pure, relatively hard thin films which thicknesses were about 0.05 to 0.3μm, were get on glass surface. Composition of the films were almost same with that of aqueous solution. It was confirmed that the crystallization of the films were depended on the applied voltage and the amount of added NH{sub}3aq.
机译:在我们目前的研究中,通过电化学沉积在含水络合物溶液中的玻璃基板上制造YSZ薄膜。氧化锆对他们的许多人物非常重要,我们的目标是通过使用环境友好的材料和低成本方法使其薄膜用于大面积和均匀的厚度。前体水溶液的组成和浓度为94mol%ZrO {sub} 2-6mol%yo {sub} 1.5和0.073mol / dm {sup} 3(ysz溶液)。 ZrO(No {sub} 3){sub} 2-2h {sub} 2o和y(no {sub} 3){sub} 3-6h {sub} 2o被zr和y来源。加入适当量(0-0.5体积%)的氨溶液以调节酸度,并在Zro(No {Sub} 3){Sub} 2和NH {Sub} 4OH之间发生自由基交换反应以产生中间形式zro(oh){sub} 2。将混合物在冰浴中搅拌1小时后,得到均匀的无色透明溶液。 ysz薄膜沉积在玻璃基板上,通过施加电压2.0-4.5V 300秒放置在碳电极上。沉积的薄膜是平坦的,透明的,但在573-773K的温度下进行无定形,使热处理1小时。根据薄膜的XRD图案,在673,773k的样品中观察到YSZ的峰。在该热处理后,厚度为约0.05至0.3μm的透明,纯,相对硬的薄膜在玻璃表面上进行。薄膜的组成与水溶液几乎相同。证实薄膜的结晶依赖于施加的电压和添加的NH {Sub} 3AQ的量。

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