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Microstructure and high-temperature strength of silicon carbide with 2000 ppm yttria

机译:2000 ppm yttra的碳化硅微观结构和高温强度

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摘要

A dense silicon carbide (SiC) ceramic with a very high flexural strength at 2000°C (981 ±128 MPa) was obtained by conventional hot-pressing with extremely low additive content (2000 ppm Y_2O_3). Observations using high-resolution transmission electron microscopy (HRTEM) showed that (1) homophase (SiC/SiC) boundaries were clean without an intergranular glassy phase and (2) junction pockets consisted of nanocrystalline Y-containing phase embedded in an amorphous Y-Si-O-C-N phase. The excellent strength at 2000 C was attributed to the clean SiC/SiC boundary and the strengthening effect of plastic deformation.
机译:通过以极低的添加剂含量(2000ppm Y_2O_3)常规热压获得具有非常高的弯曲强度的致密碳化硅(SiC)陶瓷具有非常高的弯曲强度(981±128MPa)。 使用高分辨率透射电子显微镜(HRTEM)的观察显示(1)常离子基(SiC / SiC)边界在没有晶间玻璃相的情况下清洁,并且(2)连接袋由嵌入无定形Y-Si中的纳米晶Y型相组成 -OCN阶段。 2000℃的优异强度归因于清洁的SiC / SiC边界和塑性变形的强化效果。

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