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首页> 外文期刊>Journal of physical chemistry letters >Vibrational Sum Frequency Generation Spectroscopy Measurement of the Rotational Barrier of Methyl Groups on Methyl-Terminated Silicon(111) Surfaces
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Vibrational Sum Frequency Generation Spectroscopy Measurement of the Rotational Barrier of Methyl Groups on Methyl-Terminated Silicon(111) Surfaces

机译:甲基封端硅(111)表面上甲基旋转屏障的振动和频率产生光谱测量

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摘要

The methyl-terminated Si(111) surface possesses a 3-fold in-plane symmetry, with the methyl groups oriented perpendicular to the substrate. The propeller-like rotation of the methyl groups is hindered at room temperature and proceeds via 120 degrees jumps between three isoenergetic minima in registry with the crystalline Si substrate. We have used line-shape analysis of polarization-selected vibrational sum frequency generation spectroscopy to determine the rotational relaxation rate of the surface methyl groups and have measured the temperature dependence of the relaxation rate between 20 and 120 degrees C. By fitting the measured rate to an Arrhenius dependence, we extracted an activation energy (the rotational barrier) of 830 +/- 360 cm(-1) and an attempt frequency of (2.9 +/- 4.2) x 10(13)s(-1) for the methyl rotation process. Comparison with the harmonic frequency of a methyl group in a 3-fold cosine potential suggests that the hindered rotation occurs via uncorrelated jumps of single methyl groups rather than concerted gear-like rotation.
机译:甲基封端的Si(111)表面具有3倍的面内对称性,垂直于基材取向的甲基。甲基的螺旋桨状旋转在室温下受阻,通过120度进行120度,在使用晶体Si衬底的寄存器中的三个异射性最小值之间跳跃。我们已经使用了偏振型振动和频率产生光谱的线形分析以确定表面甲基的旋转弛豫速率,并通过将测量的速率安装到Arrhenius依赖性,我们提取了830 +/- 360cm(-1)的激活能量(旋转屏障)和甲基的(2.9 +/- 4.2)×10(13)S(-1)的尝试频率旋转过程。与3倍余弦电位中甲基的谐波谐波的比较表明,通过单个甲基的不相关跳跃而不是齐全的齿轮状旋转发生阻碍旋转。

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