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首页> 外文期刊>Journal of optoelectronics and advanced materials >Structural, electrical and optical properties of undoped ZnO thin films using ion beam sputtering and spray pyrolysis techniques
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Structural, electrical and optical properties of undoped ZnO thin films using ion beam sputtering and spray pyrolysis techniques

机译:采用离子束溅射和喷雾热解技术的未掺杂ZnO薄膜的结构,电气和光学性能

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In this work, the structural, electrical and optical properties of undoped ZnO amorphous thin films prepared using Ion Beam Sputtering (IBS) and spray pyrolysis deposition techniques are presented. From the structural measurements, a transition from amorphous to polycrystalline phase has been observed at around 130 degrees C. From the optical measurements, the energy gap has been determined and showed an increase with the thickness of the films. The electric conductivity shows three different regimes. At low temperatures (T < 300 K), the electric conductivity increases linearly with temperature (semiconducting behaviour). At around 300 K, the conductivity is almost independent of temperature. For T > 300 K, the conductivity decreases almost linearly with temperature (metallic behaviour). This metallic behaviour might be related to the oxygen adsorption above room temperature. In addition, three regimes have been identified for the conduction mechanisms from the variation of both the electric conductivity and the seebeck coefficient as a function of temperature. Comparison between the results obtained by the two techniques is presented.
机译:在这项工作中,提出了使用离子束溅射(IBS)制备的未掺杂ZnO非晶薄膜(IBS)和喷雾热解沉积技术的结构,电气和光学性质。从结构测量中,已经在约130℃下观察到从无定形到多晶相的转变。从光学测量开始,已经确定了能量隙并且随着薄膜的厚度而增加。电导率显示三个不同的制度。在低温(T <300K)处,电导率随温度(半导体行为)线性增加。在300 k约为300 k时,电导率几乎与温度无关。对于T> 300k,电导率几乎线性地降低了温度(金属行为)。这种金属行为可能与高于室温的氧气吸附有关。此外,已经鉴定了从导电率和塞贝克系数的传导机构识别出三个制度,作为温度的函数。提出了通过两种技术获得的结果之间的比较。

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