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机译:通过化学溶液沉积未掺杂的HFO2膜中明显的铁电性
Cent South Univ State Key Lab Powder Met Changsha 410083 Peoples R China;
Cent South Univ State Key Lab Powder Met Changsha 410083 Peoples R China;
Cent South Univ State Key Lab Powder Met Changsha 410083 Peoples R China;
Cent South Univ State Key Lab Powder Met Changsha 410083 Peoples R China;
Cent South Univ State Key Lab Powder Met Changsha 410083 Peoples R China;
Cent South Univ State Key Lab Powder Met Changsha 410083 Peoples R China;
Cent South Univ State Key Lab Powder Met Changsha 410083 Peoples R China;
机译:通过化学溶液沉积未掺杂的HFO2膜中明显的铁电性
机译:铁电SR的化学溶液沉积:无机盐前体的HFO2薄膜
机译:通过溅射沉积的未掺杂的HFO2薄膜的铁电相起源(Vol 6,900042,2019)
机译:铁电晶体管应用中溅射和化学溶液沉积沉积的铁氧化锆膜中铁电性的鲁棒性
机译:硅,二氧化硅,钛和铁电薄膜的化学气相沉积。
机译:水溶液化学沉积控制K0.5Na0.5NbO3薄膜的相纯度和织构
机译:通过化学溶液沉积制造的BATIO3膜中增强的面内铁电性
机译:铁电pZT薄膜的金属有机溶液沉积