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Mechanical properties of electrochemically synthesised metal-organic framework thin films

机译:电化学合成金属 - 有机框架薄膜的力学性能

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We investigated the mechanical properties of metal-organic framework thin-film coatings grown by an electrochemical method, which allows fast deposition in environmentally friendly solvents. For the first time, Cu(CHDA) and Cu(INA)2 are electrochemically synthesised as dense coatings on Cu-electrodes, alongside the well-known Cu3(BTC)2 (CHDA = trans-cyclohexane-1,4-dicarboxylate; INA = isonicotinate; BTC = benzene-1,3,5-tricarboxylate). In order to probe the mechanical behaviour of the MOF coatings, both nanoindentation and nanoscratch experiments are performed. The indentation of a polycrystalline film allows the determination of average Young's moduli and hardness of the coatings. Cu(CHDA) exhibits the highest stiffness and hardness, with values of 10.9 GPa and 0.46 GPa, respectively. Intermediate values are obtained for the well-known Cu3(BTC)2 and the smallest values for Cu(INA)2. A close inspection of the crystal lattice of the MOF materials under investigation allows for correlating the mechanical properties and structural building units of these materials. Finally, the effect of the fundamental mechanical properties of MOF films on their scratch and wear resistance is illustrated.
机译:我们研究了通过电化学方法生长的金属 - 有机框架薄膜涂层的机械性能,这允许在环保溶剂中快速沉积。首先,Cu(CHDA)和Cu(INA)2在Cu电极上以致密涂层电化学合成,以及众所周知的Cu3(BTC)2(CHDA =反式环己烷-1,4-二羧酸盐; INA = Isonicotinate; BTC =苯-1,3,5-三羧酸盐)。为了探测MOF涂层的力学行为,进行纳米茚和纳米克触发实验。多晶膜的压痕允许测定涂层的平均杨氏的模态和硬度。 Cu(CHDA)具有最高的刚度和硬度,分别为10.9GPa和0.46gPa的值。用于众所周知的Cu3(BTC)2和Cu(Ina)2的最小值获得中间值。在调查中密切检查MOF材料的晶格允许与这些材料的机械性能和结构构建单元相关联。最后,示出了MOF膜对其划痕和耐磨性的基本力学性能的影响。

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