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Micromechanical Behavior of Polycrystalline Metal-Organic Framework Thin Films Synthesized by Electrochemical Reaction

机译:电化学反应合成多晶金属-有机骨架薄膜的微力学行为

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We have studied the mechanical properties of an archetypical metal-organic framework (MOF) polycrystalline thin-film material, termed HKUST-1 or Cu-3(BTC)(2), which was synthesized by means of electrochemistry. We demonstrate that the average crystal size and surface coverage of electrochemically grown thin films, with associated coating thickness and surface roughness, can be controlled by adjusting not only the reaction time but also the anodic substrate surface characteristics. The polycrystalline films were characterized via scanning electron microscopy, optical three-dimensional profilometry, atomic force microscopy, and X-ray diffraction. Using an instrumented nanoindenter, we performed fine-scale nanoscratch experiments under two distinct test modes: (i) ramp-load and (ii) pass-and-return (cyclic wear), to establish the underpinning failure mechanisms of MOF coatings with varied average thicknesses (similar to 2-10 mu m). Our results reveal that the ramp-load approach is ideal to pinpoint the critical force required to debond films from the substrate, and the pass-and-return method has the propensity to crush polycrystals into a compacted layer on top of the substrate, but cause no film debonding even at a high number of cycles. Notably the film-to-substrate adhesion strength of electrochemical coatings could be enhanced with increasing HKUST-1 film thickness (similar to mu m), while the attachment of polycrystals is weakened when grown on smoother substrates.
机译:我们已经研究了一种典型的金属有机-有机骨架(MOF)多晶薄膜材料的力学性能,该材料称为HKUST-1或Cu-3(BTC)(2),是通过电化学方法合成的。我们证明,通过不仅调节反应时间而且还调节阳极基底表面特性,可以控制电化学生长薄膜的平均晶体尺寸和表面覆盖度以及相关的涂层厚度和表面粗糙度。通过扫描电子显微镜,光学三维轮廓仪,原子力显微镜和X射线衍射对多晶膜进行表征。使用仪器化的纳米压头,我们在两种不同的测试模式下进行了精细的纳米划痕实验:(i)斜坡加载和(ii)通过和返回(循环磨损),以建立具有不同平均值的MOF涂层的基础破坏机理厚度(约2-10微米)。我们的结果表明,斜坡加载方法非常适用于确定将薄膜从基板上剥离所需的临界力,而传回法具有将多晶破碎成基板顶部的致密层的倾向,但会导致即使在高循环次数下也没有膜剥离。值得注意的是,随着HKUST-1膜厚度(类似于μm)的增加,电化学涂层的膜对基底粘合强度可以增强,而在较光滑的基底上生长时,多晶的附着力会减弱。

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