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Fabrication and Temperature Dependent Electrical Characterization of n-ZnO Nanowires/p-Si Substrate Heterojunction Diodes

机译:N-ZnO纳米线/ P-Si衬底异质结二极管的制造和温度依赖性电学特性

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In this paper, we report the growth of n-ZnO nanowires on p-silicon (Si) substrate by simple thermal evaporation processing using metallic zinc powder in presence of oxygen gas at 650 degrees C. The grown nanowires were examined in terms of its morphological, structural and optical properties. The morphological characterization by field emission scanning electron microscopy (FESEM) revealed the high density growth of quasi-aligned ZnO nanowires on the silicon substrate. The X-ray diffraction pattern revealed that the nanowires are well-crystalline and possess wurtzite hexagonal phase of ZnO. The room-temperature photoluminescence (PL) spectra of grown nanowires exhibited a sharp and strong UV emission and a suppressed green emission which revealed that the grown nanowires possess well-crystallinity and less structural defects. A heterojunction diode was fabricated based on n-ZnO nanowires/p-Si substrate assembly and temperature dependent electrical properties were examined. The fabricated heterojunction diode exhibits a change in the forward current between similar to 4 mA and similar to 12 mA due to the increase in temperature from 30 degrees C to 100 degrees C at a turn-on voltage of similar to 5.0 V. The low values of series resistance (similar to 38 Omega and similar to 13 Omega at 30 degrees C and 100 degrees C, respectively) determined in the forward bias condition might cause reasonable reduction in any possible partial drop in the output current of the whole assembly. This is an indication that the effect of shunt resistance is minimal. The obtained values of quality factors suggest that the fabricated device exhibit inhomogeneity at the interface and good stability over change in temperatures.
机译:在本文中,我们通过在650℃的氧气存在下使用金属锌粉在氧气存在下通过简单的热蒸发处理报告对硅(Si)衬底上的N-ZnO纳米线的生长。在其形态学中检查生长的纳米线,结构和光学性质。现场发射扫描电子显微镜(FESEM)的形态学特征揭示了硅衬底上的准取向ZnO纳米线的高密度生长。 X射线衍射图案显示纳米线是晶莹剔透的并且具有ZnO的紫立岩六方相。生长纳米线的室温光致发光(PL)光谱表现出尖锐且强的UV排放和抑制的绿色发射,揭示生长的纳米线具有良好的结晶度和较少的结构缺陷。基于N-ZnO纳米线/ P-Si衬底组件制造的异质结二极管,并检查温度依赖性电性能。所制造的异质结二极管在类似于4 mA之间的正向电流的变化,并且由于在与5.0 V类似于5.0 V的导通电压下的温度为30℃至100摄氏度,而导致的12mA。低值在正向偏置条件下确定的串联电阻(类似于38Ω和33Ω分别在30℃和100摄氏度下,分别)可能导致整个组件的输出电流中的任何可能的部分下降造成合理降低。这表明分流抗性的效果是最小的。所获得的质量因素的值表明,制造的装置在界面处表现出不均匀性,并且在温度变化的良好稳定性上表现出良好的稳定性。

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