Low-stress diamond films deposited on stainless steel by a two-step dropped power process in chemical vapor deposition

摘要

AbstractA continuous low-stress diamond film has been prepared on stainless steel by a novel two-step dropped power process using a Cr/CrN/CrTiAlN film as an interlayer. After the interlayer was deposited on the stainless steel, isolated diamond particles were firstly prepared under high power of 1800W for 10min in CVD, which has low stress, releasing most of thermal stress. Then, the low power of 1500W was adopted to form continuous diamond films. The stress is obviously lower than that of the continuous diamond film deposited only in the first CVD process, indicating that the two-step dropped power process surely decreases the internal stress of the film. The blocky microstructure on sandblasted stainless steel is beneficial to releases the stress. And the existence of very small amount of pores in the diamond film also benefits the stress releasing.Graphical abstractA novel two-step dropped power process in chemical vapor deposition was proposed to prepare low stress diamond film on stainless steels.Display OmittedHighlights?A novel two-step dropped power is proposed to deposit a low stress diamond film.?Isolated diamond particles releases most of the stress from high power to low power.?The formed blocky structure benefits stress accommodation.?A Cr/CrN/CrTiAlN interlayer block iron outward diffusion and carbon inward diffusion]]>