Structure, mechanical and tribological properties of Ti-doped amorphous carbon films simultaneously deposited by magnetron sputtering and pulse cathodic arc
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Structure, mechanical and tribological properties of Ti-doped amorphous carbon films simultaneously deposited by magnetron sputtering and pulse cathodic arc

机译:通过磁控溅射和脉冲阴极弧同时沉积Ti掺杂无定形碳膜的结构,机械和摩擦学特性

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Abstract In this paper, the structure as well as tribological properties of amorphous carbon (a-C) films modified by titanium doping (a-C:Ti) were examined. The a-C:Ti films were deposited by simultaneously using use of pulse cathodic carbon arc technique and with direct current Ti magnetron sputtering. Structure and surface morphology of the a-C and a-C:Ti films were analyzed by Raman spectroscopy, X-ray photoelectron spectroscopy, atomic force microscopy, and scanning electron microscopy (SEM) equipped with energy dispersive X-ray spectroscopy. Friction parameters of the films have been studied under the condition of dry sliding using a “sphere-plane” method. Under the effect of Ti doping, there was an increase in the friction coefficient of the a-C:Ti films from 0.17 up to 0.21 vs. 0.14 for a-C film. In contrast, the counterbody wear rate was 2.2–3.8 times lower in the case of the a-C:Ti films compared with that of the a-C film, which is attributed to the changes in the a-C:Ti films with respect to their phase composition, surface morphology and microhardness under the action of Ti. The study results of this work show that it is possible to obtain hard a-C:Ti films with good enhanced wear resistance by doping an optimal amount of Ti. Graphical abstract Display Omitted Highlights ? a-C:Ti films were deposited by means of pulse cathodic carbon arc technique with direct current Ti magnetron sputtering. ? The a-C films provide a low friction coefficient, but the highest volumetric wear rate of the counterbody. ? Ti-doping the a-C:Ti films decreases the size, ordering, and amount of sp2-C clusters. ]]>
机译:<![cdata [ 抽象 在本文中,结构以及由钛掺杂改性的无定形碳(AC)膜的结构和摩擦学特性(检查了AC:TI)。通过使用脉冲阴极碳弧技术和直流Ti磁控溅射同时沉积A-C:Ti膜。通过拉曼光谱,X射线光电子能谱,原子力显微镜,原子力显微镜和配备能量分散X射线光谱的扫描电子显微镜(SEM)分析A-C和A-C:Ti膜的结构和表面形态。已经在使用“球面”方法的干滑动条件下研究了薄膜的摩擦参数。在Ti掺杂的作用下,A-C:Ti薄膜的摩擦系数增加0.17至0.21与0.14的A-C膜。相比之下,在AC的情况下,靶磨损率为2.2-3.8倍,与AC膜相比,与AC膜相比,归因于AC:Ti膜相对于其相组成,表面的变化Ti作用下的形态学和微硬度。该工作的研究结果表明,通过掺杂最佳的Ti,可以获得具有良好增强的耐磨性的硬交膜:Ti薄膜。 图形摘要 显示省略 亮点 ac :通过具有直流Ti磁控溅射的脉冲阴极碳弧技术沉积Ti薄膜。 交流胶片提供低摩擦系数,但靶鼠标的最高体积磨损率。 Ti-掺杂AC :TI薄膜减少SP 2 -C群集的大小,排序和数量。 ]]>

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