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The effects of SiO2 coating on diamond abrasives in sol-gel tool for SiC substrate polishing

机译:SiC2涂层对SiC基板抛光溶胶凝胶工具中金刚石磨料的影响

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摘要

In order to improve the dispersion and bonding force in the polishing tool, the diamond abrasives were surface modified by coating SiO2 layer through isothermal hydrolysis method in this study. Diamond abrasives with three different micro-nanoscale particle sizes were chosen to be modified. The structures and compositions of the modified diamond abrasives were characterized by transmission electron microscope (TEM) and Fourier transform infrared spectra (Hut). The results show that SiO2 thin film is uniformly grafted onto the diamond surface. The polishing films were prepared by using unmodified and modified diamond as abrasives based on Sol-Gel technology for the polishing tests of SiC substrates. The results of polishing tests show that the SiO2-modified diamond abrasives exhibit higher material removal rate (MRR) and better polishing quality than that of unmodified diamond abrasives. The improvement of polishing performance can be explained by the increment of dispersibility and the enhancement of binding force between the matrix of polishing film and abrasives after modification process.
机译:为了改善抛光工具中的分散和粘合力,通过本研究中的等温水解方法涂覆SiO 2层,通过涂覆SiO 2层来改变金刚石磨料。选择具有三种不同的微纳米级粒度的金刚石磨料被选择改性。通过透射电子显微镜(TEM)和傅里叶变换红外光谱(小屋)的结构和组合物的特征在于。结果表明,SiO 2薄膜均匀地接枝到金刚石表面上。通过基于SIC基材的抛光测试的溶胶 - 凝胶技术使用未改性和改性的金刚石来制备抛光膜。抛光试验结果表明,SiO2改性的金刚石磨料表现出更高的材料去除率(MRR)和比未修饰的金刚石磨料更好的抛光质量。抛光性能的改善可以通过分散性的增量和增强在改性过程后抛光膜和研磨剂基质之间的结合力的增强来解释。

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