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Effect of heat treatment on microstructures of magnetron sputtered amorphous carbon films

机译:热处理对磁控溅射非晶碳膜微观结构的影响

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摘要

In this study, the effect of heat-treatment conditions at temperatures of 800-1200 degrees C on the structure of magnetron-sputtered amorphous carbon (a-C) films was characterized using Raman spectroscopy, X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM). Results show that heat treatment leads to the formation of an ordered structure in a-C films, including an increased degree of graphitization, although the formed carbon crystal is not graphite. For heat-treatment temperatures above 900 degrees C, the crystalline structure of a-C films is enhanced, and the diffraction characteristic peaks of lonsdaleite (102) and C (109) appear near 2 theta = 61.8 degrees and 66.7 degrees, respectively. At the same time, carbon microcrystalline aggregation and a lamellar crystal structure appear on the surface of the films. With increasing treatment temperature, carbon accumulation appears on the a-C film surfaces; the lamellar crystals disappear when the treatment temperature reaches 1200 degrees C, and flowing sand-like stacking is apparent on the film surfaces. With the deepening of the heat-treatment process, the columnar cross-sectional structure of the a-C films disappears. The surface roughness of the a-C films increases after heat treatment; except in the case of a treatment temperature of 1100 degrees C.
机译:在该研究中,使用拉曼光谱法,X射线衍射(XRD),扫描电子显微镜(扫描电子显微镜( SEM)和原子力显微镜(AFM)。结果表明,热处理导致在A-C薄膜中形成有序结构,包括增加的石墨化程度,尽管形成的碳晶体不是石墨。对于高于900℃的热处理温度,增强了A-C膜的晶体结构,兰替代矿(102)和C(109)的衍射特性峰值分别在2°= 61.8度附近出现,分别为66.7度。同时,碳微晶聚集和层状晶体结构出现在薄膜的表面上。随着处理温度的增加,A-C薄膜表面上出现碳积累;当处理温度达到1200℃时,层状晶体消失,在薄膜表面上显而易见的流动的砂状堆叠。随着热处理过程的深,A-C薄膜的柱状横截面结构消失。 A-C薄膜的表面粗糙度在热处理后增加;除了处理温度为1100℃的情况下。

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