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首页> 外文期刊>Diamond and Related Materials >Function of aluminum coating on fabrication of nanowhiskers by radio frequency plasma etching
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Function of aluminum coating on fabrication of nanowhiskers by radio frequency plasma etching

机译:轧铝涂层对纳米须轨道制造的作用,射频等离子蚀刻

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摘要

Diamond nanowhiskers could be obtained by anisotropic etching of as-grown and aluminum coated diamond films in a radio frequency (RF) Ar/O_2 plasma. The distributions of diamond nanowhiskers were on the presence of Al coatings. For the Al-coated diamond film, the distribution of the whiskers was almost same as that of the coated Al particles. However, for the as-grown diamond film, the whiskers randomly formed on the diamond surface with higher etching rate. Comparing these two situations, we found that Al coating was a critical factor in the etching process which served as mask contributing to restraining etching the film underneath. The whiskers (1 mu m in height and 50 nm in diameter) could be obtained under optimum etching conditions. In addition, the dependence of the distribution of the whiskers on Al coating time was demonstrated.
机译:通过在射频(RF)AR / O_2等离子体中的诸如生长和铝涂覆的金刚石膜的各向异性蚀刻来获得金刚石纳米轨。 金刚石纳米须敏的分布在Al涂层的存在下。 对于Al涂覆的金刚石膜,晶须的分布几乎与涂覆的Al颗粒的分布相同。 然而,对于生长的金刚石薄膜,晶须随着较高的蚀刻速率随机形成在金刚石表面上。 比较这两个情况,我们发现Al涂层是蚀刻过程中的临界因子,其用作掩模的掩模,有助于抑制蚀刻下面的膜。 可以在最佳蚀刻条件下获得晶须(直径高度和50nm的50nm)。 此外,证明了晶须分布对Al涂布时间的依赖性。

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