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Nanowhiskers formation by radio frequency Ar/O_2 plasma etching of aluminum coated diamond films

机译:射频Ar / O_2等离子体刻蚀铝涂层金刚石薄膜形成纳米晶须

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摘要

Diamond nanowhiskers were fabricated by etching as-grown and aluminum coated diamond films in radio frequency (RF) Ar/O_2 plasma. It was found that diamond nanowhiskers could be obtained by anisotropic etching of both kinds of films. For the as-grown diamond film, the whiskers randomly formed on the diamond surface with higher etching rate. However, for the Al-coated diamond film, an energy dispersive X-ray spectroscopy measurement revealed that the distribution of the whiskers was the same as that of the coated Al particles. During the etching process, Al particles served as masks contributing to restraining the etching of the film underneath. It was found that the distribution of the whiskers was significantly influenced by the Al coating. The whiskers (1 μm in height and 50 nm in diameter) could be obtained under the optimum etching condition. In addition, the dependence of the distribution of the whiskers on Al coating time was demonstrated.
机译:金刚石纳米晶须是通过在射频(RF)Ar / O_2等离子体中蚀刻已生长的铝涂层金刚石薄膜而制成的。已经发现,可以通过两种膜的各向异性蚀刻获得金刚石纳米晶须。对于成膜的金刚石膜,晶须以较高的蚀刻速率随机地形成在金刚石表面上。但是,对于涂有Al的金刚石膜,能量色散X射线光谱测量表明,晶须的分布与涂有Al的颗粒的分布相同。在蚀刻过程中,Al颗粒用作掩膜,有助于抑制下面的膜的蚀刻。发现晶须的分布受到Al涂层的显着影响。在最佳刻蚀条件下,可以获得晶须(高度为1μm,直径为50 nm)。另外,证明了晶须的分布对Al涂覆时间的依赖性。

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